The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2020
Filed:
Jul. 08, 2016
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Antti Niskanen, Helsinki, FI;
Eva Tois, Espoo, FI;
Hidemi Suemori, Helsinki, FI;
Suvi Haukka, Helsinki, FI;
Assignee:
ASM IP Holdings B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/455 (2006.01); C23C 16/04 (2006.01); C23C 16/06 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45525 (2013.01); C23C 16/04 (2013.01); C23C 16/06 (2013.01); C23C 16/40 (2013.01); C23C 16/45553 (2013.01);
Abstract
A method for selectively depositing a metal oxide film is disclosed. In particular, the method comprises pulsing a metal or semi-metal precursor onto the substrate and pulsing an organic reactant onto the substrate. A reaction between the metal or semi-metal precursor and the organic reactant selectively forms a metal oxide film on either a dielectric layer or a metal layer.