The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2020
Filed:
Sep. 30, 2015
Shibaura Mechatronics Corporation, Yokohama-shi, JP;
Konosuke Hayashi, Yokohama, JP;
Takashi Ootagaki, Yokohama, JP;
SHIBAURA MECHATRONICS CORPORATION, Yokohama-shi, JP;
Abstract
According to one embodiment, a substrate processing apparatus includes: a removing part (D) configured to remove liquid droplets present in a recess (); a drain hole () located at the bottom of the recess () of a nozzle head (), and configured to discharge the liquid droplets as a target to be removed out of the recess (); and a controller configured to control the discharge state of a gas discharge nozzle () such that there is a period in which a gas is discharged from the gas discharge nozzle () at a flow rate, at which the gas discharged does not reach a surface to be processed of s substrate W, in a period from the end of the rinsing process using a treatment liquid to the start of the drying process using the gas.