The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 24, 2020

Filed:

Aug. 24, 2016
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/60 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); G03F 7/70783 (2013.01);
Abstract

A substrate holder (WT) for use in a lithographic apparatus and configured to support a substrate, the substrate holder comprising: a main body () having a main body surface; and a plurality of burls () projecting from the main body surface; wherein each burl has a distal end configured to engage with the substrate; the distal ends of the burls substantially conform to a support plane whereby a substrate can be supported in a substantially flat state on the burls; and a flow control feature () configured to form a gas cushion adjacent the periphery of the substrate holder when a substrate is being lowered onto the substrate holder.


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