The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Mar. 24, 2014
Dai Nippon Printing Co., Ltd., Tokyo, JP;
Katsunari Obata, Tokyo, JP;
Toshihiko Takeda, Tokyo, JP;
Hiroshi Kawasaki, Tokyo, JP;
Hiroyuki Nishimura, Tokyo, JP;
Atsushi Maki, Tokyo, JP;
Hiromitsu Ochiai, Tokyo, JP;
Yoshinori Hirobe, Tokyo, JP;
Dai Nippon Printing Co., Ltd., Shinjuku-Ku, JP;
Abstract
There are provided a vapor deposition mask capable of satisfying both high definition and lightweight in upsizing and forming a vapor deposition pattern with high definition while securing strength, a vapor deposition mask preparation body capable of simply producing the vapor deposition mask and a method for producing a vapor deposition mask, and furthermore, a method for producing an organic semiconductor element capable of producing an organic semiconductor element with high definition. A metal maskin which a slitis provided and a resin maskin which openingscorresponding to a pattern to be produced by vapor deposition are provided at a position of overlapping with the slitare stacked, and the metal maskhas a general regionin which the slitis provided and a thick regionlarger in thickness than the general region.