The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2020
Filed:
Dec. 10, 2018
Semiconductor Manufacturing International (Beijing) Corporation, Beijing, CN;
Semiconductor Manufacturing International (Shanghai) Corporation, Shanghai, CN;
Qing Yang, Shanghai, CN;
Abstract
A method for manufacturing a reticle for double patterning includes providing a first reticle for a first patterning and a second reticle for a second patterning according to a target pattern, the first reticle having a first mask pattern, and the second reticle having a second mask pattern, the first patterning being performed before the second patterning, and forming a sub-resolution assist feature (SRAF) pattern at a gap of the first mask pattern of the first reticle. The SRAF pattern is covered by the second mask pattern of the second reticle and has a size sufficient large to enable a transfer of the SRAF pattern to a material to be patterned in the first patterning.