The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 17, 2020

Filed:

Sep. 13, 2017
Applicant:

Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;

Inventors:

Benedikt Haas, Grenoble, FR;

David Cooper, Grenoble, FR;

Jean-Luc Rouviere, Meylan, FR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); H01J 37/26 (2006.01); H01J 37/295 (2006.01); G01N 23/20058 (2018.01); G01N 23/2055 (2018.01); G01R 33/02 (2006.01); G01N 27/06 (2006.01); G01R 29/08 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); G01N 23/2055 (2013.01); G01N 23/20058 (2013.01); G01N 27/06 (2013.01); G01R 29/08 (2013.01); G01R 33/02 (2013.01); H01J 37/268 (2013.01); H01J 37/2955 (2013.01); H01J 2237/2614 (2013.01); H01J 2237/2805 (2013.01);
Abstract

A method of determining a local electric field and/or a local magnetic field in a sample and/or the dielectric constant of a material and/or the angle between the input and output surfaces of the sample, comprising illumination of the sample by an electron beam in precession mode using an illumination device, generation of a diffraction pattern, determination of the offset of the disk corresponding to the transmitted beam due to the electric field and/or the magnetic field, by comparison of the diffraction pattern and a reference diffraction pattern, determination of a deflection angle of the transmitted beam, and determination of the value of the local electric field and/or the local magnetic field of the sample and/or determination of the dielectric constant of materials and/or determination of the angle between the input and output surfaces of the sample.


Find Patent Forward Citations

Haas, Benedikt. (2020). Method of determining the deflection of an electron beam resulting from an electric field and/or a magnetic field (U.S. Patent No. 10593511). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10593511

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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