The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Oct. 23, 2014
Asml Netherlands B.v., Veldhoven, NL;
Rolf Theodorus Nicolaas Beijsens, Eindhoven, NL;
Kornelis Frits Feenstra, 's-Gravenhage, NL;
Arjen Teake De Jong, Barneveld, NL;
Reinier Theodorus Martinus Jilisen, Eindhoven, NL;
Niek Antonius Jacobus Maria Kleemans, Eindhoven, NL;
Andrey Nikipelov, Eindhoven, NL;
Pavel Seroglazov, Eindhoven, NL;
Nicolaas Antonius Allegondus Johannes Van Asten, Breda, NL;
Harald Ernest Verbraak, Maastricht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A radiation system to generate a radiation emitting plasma, the radiation system include a fuel emitter to provide a fuel target at a plasma formation region, a first laser arranged to provide a first laser beam at the plasma formation region incident on the fuel target to generate a radiation emitting plasma, an imaging device arranged to obtain a first image of the radiation emitting plasma at the plasma formation region, the first image indicating at least one image property of the radiation emitting plasma, and a controller. The controller is arranged to receive the first image, and to generate at least one instruction based on the at least one image property of the radiation emitting plasma to modify operation of at least one component of the radiation system to reduce a detrimental effect of debris.