The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Jan. 24, 2019
Asml Netherlands B.v., Veldhoven, NL;
Anagnostis Tsiatmas, Eindhoven, NL;
Joannes Jitse Venselaar, 's-Hertogenbosch, NL;
Samee Ur Rehman, Eindhoven, NL;
Mariya Vyacheslavivna Medvedyeva, Eindhoven, NL;
Bastiaan Onne Fagginger Auer, Eindhoven, NL;
Martijn Maria Zaal, Veldhoven, NL;
Thaleia Kontoroupi, Utrecht, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Methods of optimizing a metrology process are disclosed. In one arrangement, measurement data from a plurality of applications of the metrology process to a first target on a substrate are obtained. Each application of the metrology process includes illuminating the first target with a radiation spot and detecting radiation redirected by the first target. The applications of the metrology process include applications at a) plural positions of the radiation spot relative to the first target, and/or b) plural focus heights of the radiation spot. The measurement data includes, for each application of the metrology process, a detected pupil representation of an optical characteristic of the redirected radiation in a pupil plane. The method includes determining an optimal alignment and/or an optimal focus height based on comparisons between the detected pupil representations in the measurement data and a reference pupil representation.