The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2020
Filed:
Mar. 14, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shigeyuki Okura, Yamanashi, JP;
Yuki Keimoto, Yamanashi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/285 (2006.01); C23C 16/455 (2006.01); C23C 16/44 (2006.01); C23C 16/34 (2006.01); H01L 21/3205 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45527 (2013.01); C23C 16/34 (2013.01); C23C 16/4412 (2013.01); H01L 21/28556 (2013.01); H01L 21/28562 (2013.01); H01L 21/28568 (2013.01); H01L 21/32051 (2013.01); H01L 21/76841 (2013.01);
Abstract
In a substrate processing method for processing a substrate by alternately performing a processing gas supply step of supplying a processing gas for processing the substrate into a processing chamber which accommodates the substrate and to which a gas exhaust line is connected and a replacement gas supply step of supplying a replacement gas for replacing an atmosphere in the processing chamber into the processing chamber multiple times, a ballast gas is introduced into the gas exhaust line when the processing gas supply step is performed.