The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Oct. 31, 2016
Samsung Electronics Co., Ltd., Suwon-si, KR;
Dongqing Zou, Beijing, CN;
Ping Guo, Beijing, CN;
Qiang Wang, Beijing, CN;
Baek Hwan Cho, Seoul, KR;
Keun Joo Park, Seoul, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, KR;
Abstract
A method and apparatus for processing a binocular disparity image are provided. A method of determining a disparity of a binocular disparity image that includes a left eye image and a right eye image includes acquiring features of a plurality of pixels of the binocular disparity image based on an event distribution of the binocular disparity image, calculating a cost matrix of matching respective pixels between the left eye image and the right eye image based on the features, and determining a disparity of each matched pair of pixels based on the cost matrix.