The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Jul. 10, 2017
Applicant:
Macronix International Co., Ltd., Hsinchu, TW;
Inventors:
Chi-Hao Huang, Hsinchu, TW;
Chin-Cheng Yang, Hsinchu, TW;
Assignee:
MACRONIX International Co., Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/11578 (2017.01); H01L 27/11582 (2017.01); H01L 27/11573 (2017.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/265 (2006.01); H01L 21/762 (2006.01); H01L 21/266 (2006.01); H01L 21/306 (2006.01); H01L 27/108 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11578 (2013.01); H01L 21/266 (2013.01); H01L 21/26533 (2013.01); H01L 21/3065 (2013.01); H01L 21/3086 (2013.01); H01L 27/11573 (2013.01); H01L 27/11582 (2013.01); H01L 21/3081 (2013.01); H01L 21/30604 (2013.01); H01L 21/76229 (2013.01); H01L 21/76237 (2013.01); H01L 27/10823 (2013.01); H01L 27/10876 (2013.01); H01L 2251/105 (2013.01);
Abstract
A semiconductor device and method of fabricating the same are provided. The semiconductor device includes a substrate having a trench and an etching stop layer. The etching stop layer is disposed in the substrate and surrounds the bottom surface and a portion of a sidewall of the trench.
Huang, Chi-Hao. (2020). Semiconductor device having etching control layer in substrate and method of fabricating the same (U.S. Patent No. 10580789). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10580789
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile