The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
May. 07, 2018
Applicant:
Lam Research Corporation, Fremont, CA (US);
Inventors:
Yongsik Yu, Milpitas, CA (US);
Bart J. van Schravendijk, Palo Alto, CA (US);
Nagraj Shankar, Tualatin, OR (US);
Bhadri N. Varadarajan, Beaverton, OR (US);
Assignee:
Lam Research Corporation, Fremont, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 21/56 (2006.01); H01L 21/02 (2006.01); H01L 27/11575 (2017.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
H01L 21/76816 (2013.01); H01L 21/0228 (2013.01); H01L 21/02167 (2013.01); H01L 21/02274 (2013.01); H01L 21/56 (2013.01); H01L 27/11575 (2013.01); H01L 27/11582 (2013.01);
Abstract
Methods and apparatuses for depositing an encapsulation layer over a staircase structure during fabrication of a 3D NAND structure to prevent degradation of an oxide-oxide interface and to prevent punchthrough of a wordline are provided. The encapsulation layer is a carbon-containing conformal film deposited over a staircase structure of alternating oxide and nitride layers prior to depositing oxide over the staircase structure.