The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 03, 2020
Filed:
Jun. 29, 2017
Screen Holdings Co., Ltd., Kyoto, JP;
Takayuki Aoyama, Kyoto, JP;
Yasuaki Kondo, Kyoto, JP;
Shinji Miyawaki, Kyoto, JP;
Shinichi Kato, Kyoto, JP;
Kazuhiko Fuse, Kyoto, JP;
Hideaki Tanimura, Kyoto, JP;
Akitsugu Ueda, Kyoto, JP;
Hikaru Kawarazaki, Kyoto, JP;
Masashi Furukawa, Kyoyo, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Abstract
A heat treatment apparatus is provided with two cool chambers, that is, a first cool chamber and a second cool chamber. A semiconductor wafer before treatment is alternately carried into the first cool chamber or the second cool chamber and then transported to a heat treatment part by a transport robot after a nitrogen purge is performed. The semiconductor wafer after being heat-treated in the heat treatment part is alternately transported to the first cool chamber or the second cool chamber to be cooled. A sufficient cooling time is secured for the independent semiconductor wafer, and a reduction in throughput as the whole heat treatment apparatus can be suppressed.