The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
Dec. 20, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Xiaowei Wu, San Jose, CA (US);
David Fenwick, Los Altos Hills, CA (US);
Jennifer Y. Sun, Mountain View, CA (US);
Guodong Zhan, Woodlands, TX (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); H01J 37/32 (2006.01); C23C 16/06 (2006.01); C23C 16/50 (2006.01); C23C 16/40 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); C23C 16/06 (2013.01); C23C 16/403 (2013.01); C23C 16/45527 (2013.01); C23C 16/45529 (2013.01); C23C 16/45544 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 2237/334 (2013.01); H01J 2237/335 (2013.01); H01J 2237/3321 (2013.01); H01L 21/67028 (2013.01); H01L 21/67069 (2013.01);
Abstract
Described herein are articles, systems and methods where a plasma resistant coating is deposited onto a surface of a chamber component using an atomic layer deposition (ALD) process. The plasma resistant coating has a stress relief layer and a layer comprising a solid solution of YO—ZrOand uniformly covers features, such as those having an aspect ratio of about 3:1 to about 300:1.