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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10570513 B1

PDFFull Text
Date of Patent:
Feb. 25, 2020

Filed:

Dec. 10, 2015

Organosilane precursors for ald/cvd silicon-containing film applications and methods of using the same

Applicants:

American Air Liquide, Inc., Fremont, CA (US);

Glenn Kuchenbeiser, Newark, DE (US);

Claudia Fafard, Newark, DE (US);

Inventors:

Glenn Kuchenbeiser, Newark, DE (US);

Claudia Fafard, Newark, DE (US);

Assignee:

American Air Liquide, Inc., Fremont, CA (US);

Attorneys:

Patricia E. McQueeney

Yan Jiang

Primary Examiner:

Clinton A Brooks

Assistant Examiner:

Kofi Adzamli

Int. Cl.
CPC ...
C23C 16/30 (2006.01); C23C 16/455 (2006.01); C07F 7/02 (2006.01); C09D 4/00 (2006.01); C23C 16/50 (2006.01); C23C 16/56 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C07F 7/025 (2013.01); C09D 4/00 (2013.01); C23C 16/30 (2013.01); C23C 16/50 (2013.01); C23C 16/56 (2013.01);
Abstract

Disclosed are organosilane precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes. The disclosed organosilane precursors have the following formula: SiH(RN—(CR)—NR)(NRR)wherein R may each independently be H, a Cto Calkyl group, or a C-Caryl or heterocycle group, x+y+z=4 and n, x, y and z are integers, provided that x≠3 when y=1. Preferably, n=1 to 3, x=0 to 2, y=1 to 2, and z=1 to 3.

Find Patent Forward Citations

Kuchenbeiser, Glenn. (2020). Organosilane precursors for ald/cvd silicon-containing film applications and methods of using the same (U.S. Patent No. 10570513). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10570513

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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