The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2020

Filed:

Oct. 30, 2017
Applicant:

Fujimi Incorporated, Aichi, JP;

Inventors:

Hooi-Sung Kim, Tualatin, OR (US);

Anne Miller, Tualatin, OR (US);

Assignee:

FUJIMI INCORPORATED, Kiyosu-Shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); H01L 21/302 (2006.01); H01L 21/304 (2006.01); H01L 21/461 (2006.01); C09G 1/00 (2006.01); H01L 21/306 (2006.01); C09K 3/14 (2006.01); C23F 4/00 (2006.01); H01L 21/321 (2006.01); C23F 3/04 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); C09G 1/00 (2013.01); C09K 3/1463 (2013.01); C23F 3/04 (2013.01); C23F 4/00 (2013.01); H01L 21/302 (2013.01); H01L 21/304 (2013.01); H01L 21/30625 (2013.01); H01L 21/3212 (2013.01); H01L 21/461 (2013.01);
Abstract

Described herein are polishing compositions containing an abrasive and a buffering material, wherein the pH of the polishing composition is about 6 to about 9, and methods of preparing and using the same.


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