The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

May. 07, 2015
Applicant:

Cambridge Electronics, Inc., Cambridge, MA (US);

Inventors:

Bin Lu, Boston, MA (US);

Tomas Palacios, Belmont, MA (US);

Ling Xia, Somerville, MA (US);

Mohamed Azize, Medford, MA (US);

Assignee:

CAMBRIDGE ELECTRONICS, INC., Cambridge, MA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 29/10 (2006.01); H01L 29/861 (2006.01); H01L 21/283 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01); H01L 29/06 (2006.01); H01L 29/778 (2006.01); H01L 29/78 (2006.01); H01L 29/16 (2006.01); H01L 29/20 (2006.01); H01L 29/22 (2006.01); H01L 29/205 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02565 (2013.01); H01L 21/0254 (2013.01); H01L 21/02527 (2013.01); H01L 21/02529 (2013.01); H01L 21/02532 (2013.01); H01L 21/283 (2013.01); H01L 29/0619 (2013.01); H01L 29/0646 (2013.01); H01L 29/1033 (2013.01); H01L 29/1037 (2013.01); H01L 29/1041 (2013.01); H01L 29/1054 (2013.01); H01L 29/4236 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01); H01L 29/78 (2013.01); H01L 29/861 (2013.01); H01L 29/0623 (2013.01); H01L 29/0649 (2013.01); H01L 29/1602 (2013.01); H01L 29/1608 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/22 (2013.01); H01L 29/42368 (2013.01);
Abstract

A semiconductor device such as a transistor includes a source region, a drain region, a semiconductor region, at least one island region and at least one gate region. The semiconductor region is located between the source region and the drain region. The island region is located in the semiconductor region. Each of the island regions differs from the semiconductor region in one or more characteristics selected from the group including resistivity, doping type, doping concentration, strain and material composition. The gate region is located between the source region and the drain region covering at least a portion of the island regions.


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