The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 18, 2020

Filed:

Jun. 30, 2016
Applicant:

Mitutoyo Corporation, Kanagawa, JP;

Inventors:
Assignee:

MITUTOYO CORPORATION, Kanagawa, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/06 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0608 (2013.01);
Abstract

A method for measuring a height map of multiple fields of view on a surface of a substrate with an optical profilometer and combining them to a composite height map, the method includes: moving the profilometer relative to the surface from field to field along a route; measuring height maps of fields on the surface along the route with the profilometer; and, combining a plurality of height maps of measured fields by normalizing said height maps to each other to produce a composite height map of the surface; wherein the route is configured to minimize sensitivity to height drifting of the profilometer during combining a plurality of the height maps.


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