The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 11, 2020

Filed:

Nov. 19, 2018
Applicant:

Globalfoundries Singapore Pte. Ltd., Singapore, SG;

Inventors:

Eng Huat Toh, Singapore, SG;

Shyue Seng Tan, Singapore, SG;

Elgin Kiok Boone Quek, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 27/112 (2006.01); H01L 23/525 (2006.01); H01L 29/66 (2006.01); H01L 21/84 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7855 (2013.01); H01L 21/845 (2013.01); H01L 23/5252 (2013.01); H01L 27/11206 (2013.01); H01L 27/1211 (2013.01); H01L 29/6656 (2013.01); H01L 29/66545 (2013.01); H01L 29/66795 (2013.01);
Abstract

Methods of forming a compact FinFET OTP/MTP cell and a compact FDSOI OTP/MTP cell and resulting devices are provided. Embodiments include providing a substrate having a BOX layer; forming fins on the BOX layer with a gap in between; forming first and second gates, laterally separated, over and perpendicular to the fins; forming at least one third gate between the first and second gates and contacting the BOX layer through the gap, each third gate overlapping an end of a fin or both fins; forming a S/D region in each of the fins adjacent to the first and second gates, respectively, remote from the at least one third gate; utilizing each of the first and second gates as a WL; utilizing each third gate as a SL or connecting a SL to the S/D region; and connecting a BL to the S/D region or the at least one third gate.


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