The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Jan. 15, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Anirban Basu, Yorktown Heights, NY (US);
Guy M. Cohen, Yorktown Heights, NY (US);
Amlan Majumdar, Yorktown Heights, NY (US);
Yu Zhu, Yorktown Heights, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/78 (2006.01); H01L 29/205 (2006.01); H01L 21/762 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 29/205 (2013.01); H01L 21/762 (2013.01); H01L 29/66795 (2013.01); H01L 29/785 (2013.01); H01L 21/02241 (2013.01);
Abstract
A structure includes a semiconductor substrate, a semiconductor buffer layer disposed over the semiconductor substrate, an oxide layer disposed over the buffer layer, and a fin including a semiconductor material disposed over the oxide layer. The semiconductor material has an oxidation rate different from an oxidation rate of the buffer layer.