The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 11, 2020
Filed:
Nov. 08, 2017
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Wen-Zhan Zhou, Zhubei, TW;
Heng-Jen Lee, Baoshan Township, TW;
Hsu-Yuan Liu, Zhudong Township, TW;
Yu-Chen Huang, Toufen Township, TW;
Cheng-Han Wu, Taichung, TW;
Shih-Che Wang, Hsin-Chu, TW;
Ho-Yung David Hwang, Chu Pei, TW;
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Abstract
A photolithography system includes a variable-volume buffer tank, a dispensing system connected to the buffer tank, and a valve configured to release gas from a head space of the buffer tank while blocking the release of liquid from the head space. A storage container has an opening at the bottom and drains to the buffer tank through that opening. The buffer tank has a storage capacity sufficient to receive the full contents of the storage container. The system supplies chemical solutions to the dispensing system while keeping the chemical solutions from contact with air and other gases.