The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Aug. 19, 2016
Applicant:

Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;

Inventors:

Kazushige Nishimura, Tokyo, JP;

Masuyuki Sugiyama, Tokyo, JP;

Hideki Hasegawa, Tokyo, JP;

Yuichiro Hashimoto, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/62 (2006.01); H01J 49/00 (2006.01); H01J 49/04 (2006.01); H01J 49/06 (2006.01); H01J 49/26 (2006.01);
U.S. Cl.
CPC ...
G01N 27/62 (2013.01); H01J 49/0009 (2013.01); H01J 49/044 (2013.01); H01J 49/065 (2013.01); H01J 49/26 (2013.01);
Abstract

An ion analysis device includes: an ion source that ionizes an analyte in a liquid sample; an ion guide into which droplets and ions produced in the ion source are introduced, the ion guide having different outlets, one outlet being an ion outlet for the ions and the other outlet being a droplet outlet for the droplets; an ion analysis unit that analyzes ions ejected from the ion outlet; a droplet measurement unit that is placed on an axis of the droplet outlet, and measures the amount of droplets; and an analysis control section that compares the amount of droplets measured at the droplet measurement unit with a threshold.


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