The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 04, 2020

Filed:

Jul. 08, 2016
Applicant:

Nissan Chemical Industries, Ltd., Tokyo, JP;

Inventors:

Kiyomi Ema, Tokyo, JP;

Noriyuki Takakuma, Sodegaura, JP;

Tohru Nishimura, Toyama, JP;

Naoki Kawashita, Toyama, JP;

Kouji Yamaguchi, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C09K 13/04 (2006.01); C01B 33/143 (2006.01); C01B 33/148 (2006.01); C01B 33/141 (2006.01);
U.S. Cl.
CPC ...
C09K 3/1463 (2013.01); C01B 33/1412 (2013.01); C01B 33/1435 (2013.01); C01B 33/1485 (2013.01); C09K 13/04 (2013.01);
Abstract

A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition; the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.


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