The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
Mar. 05, 2015
Kla-tencor Corporation, Milpitas, CA (US);
Wei Chang, Foster City, CA (US);
Krishna Rao, San Ramon, CA (US);
Joseph Gutierrez, Santa Clara, CA (US);
Ramon Olavarria, Fremont, CA (US);
Craig MacNaughton, Los Gatos, CA (US);
Amir Azordegan, Santa Clara, CA (US);
Prasanna Dighe, San Ramon, CA (US);
KLA-Tencor Corporation, Milpitas, CA (US);
Abstract
A method to collect data and train, validate and deploy statistical models to predict overlay errors using patterned wafer geometry data and other relevant information includes selecting a training wafer set, measuring at multiple lithography steps and calculating geometry differences, applying a plurality of predictive models to the training wafer geometry differences and comparing predicted overlay to the measured overlay on the training wafer set. The most accurate predictive model is identified and the results fed-forward to the lithography scanner tool which can correct for these effects and reduce overlay errors during the wafer scan-and-expose processes.