The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2020

Filed:

Jan. 02, 2018
Applicant:

Korea Advanced Institute of Science and Technology, Daejeon, KR;

Inventors:

InGwun Jang, Daejeon, KR;

Jung Jin Kim, Daejeon, KR;

Ji Min Nam, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); A61B 6/00 (2006.01); G06T 7/11 (2017.01); G06T 7/136 (2017.01); G06T 7/155 (2017.01);
U.S. Cl.
CPC ...
G06T 7/11 (2017.01); G06T 7/136 (2017.01); G06T 7/155 (2017.01); G06T 2207/10081 (2013.01); G06T 2207/10088 (2013.01); G06T 2207/20008 (2013.01); G06T 2207/20032 (2013.01); G06T 2207/20036 (2013.01); G06T 2207/20044 (2013.01); G06T 2207/20152 (2013.01); G06T 2207/30008 (2013.01);
Abstract

Disclosed are a method and apparatus for fully automatically segmenting a joint based on a patient-specific optimal thresholding method and a watershed algorithm. The method of fully automatically segmenting an image may include the steps of extracting region information corresponding to a target object to be segmented from a medical image of the target object by associating a thresholding method and a load path algorithm, generating a first mask MASKbased on the extracted region information, generating a morphological patch by performing morphological subdivision on the medical image based on a watershed algorithm, generating a second mask MASKbased on the generated morphological patch, and segmenting an image corresponding to the target object from the medical image based on the first mask and the second mask.


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