The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Aug. 14, 2018
Applicant:
Axcelis Technologies, Inc., Beverly, MA (US);
Inventors:
Neil K. Colvin, Merrimack, NH (US);
Tseh-Jen Hsieh, Rowley, MA (US);
Paul B. Silverstein, Somerville, MA (US);
Assignee:
Axcelis Technologies, Inc., Beverly, MA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/30 (2006.01); H01J 37/08 (2006.01); H01J 37/31 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3002 (2013.01); H01J 37/08 (2013.01); H01J 37/3171 (2013.01); H01J 2237/061 (2013.01);
Abstract
An ion implantation system is provided having one or more conductive components comprised of one or more of lanthanated tungsten and a refractory metal alloyed with a predetermined percentage of a rare earth metal. The conductive component may be a component of an ion source, such as one or more of a cathode, cathode shield, a repeller, a liner, an aperture plate, an arc chamber body, and a strike plate. The aperture plate may be associated with one or more of an extraction aperture, a suppression aperture and a ground aperture.