The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Dec. 04, 2017
Asml Netherlands B.v., Veldhoven, NL;
Pieter Jeroen Johan Emanuel Hoefnagels, Eindhoven, NL;
Ronald Frank Kox, Peer, BE;
John Maria Bombeeck, Eindhoven, NL;
Johannes Cornelis Paulus Melman, Oisterwijk, NL;
Ruud Hendrikus Martinus Johannes Bloks, Helmond, NL;
Patricius Jacobus Neefs, Raamsdonksveer, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A device manufacturing method includes: confining a liquid to an immersion space between a projection system and an object; starting application of an underpressure to an extraction unit to remove fluid from a position proximate an edge of the object before the immersion space moves onto the object; moving the support table along a route comprising a series of motions such that a plurality of target positions on the object pass under the projection system; projecting through the immersion space a beam onto the target portions as the target portions pass under the projection system, the projecting performed to account for a certain predetermined thermal profile in the object; and stopping application of the underpressure at a predetermined time after the immersion space moves off the object for the last time during the series of motions to at least partly induce the certain predetermined thermal profile in the object.