The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Dec. 20, 2017
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Inventors:
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C08F 220/28 (2006.01); C08F 222/10 (2006.01); C08F 224/00 (2006.01); C08F 232/02 (2006.01); C08F 232/08 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/16 (2006.01); C08F 220/38 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 220/16 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); C08F 222/10 (2013.01); C08F 224/00 (2013.01); C08F 232/02 (2013.01); C08F 232/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/30 (2013.01); G03F 7/327 (2013.01); G03F 7/38 (2013.01); C08F 2220/283 (2013.01); C08F 2220/382 (2013.01);
Abstract
A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution by the action of acid, which includes a polymeric compound having at least two specific structural units.