The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Sep. 20, 2018
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takayuki Nakada, Toyama, JP;

Daigi Kamimura, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/67 (2006.01); C23C 16/458 (2006.01); C23C 16/455 (2006.01); C23C 16/46 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67393 (2013.01); C23C 16/4582 (2013.01); C23C 16/4583 (2013.01); C23C 16/45578 (2013.01); C23C 16/463 (2013.01); H01L 21/67017 (2013.01); H01L 21/67028 (2013.01); H01L 21/67103 (2013.01); H01L 21/67109 (2013.01); H01L 21/67248 (2013.01); H01L 21/67253 (2013.01); H01L 21/67757 (2013.01); H01L 21/67781 (2013.01);
Abstract

There is provided a technique includes: a substrate holder including a heat insulating part and a substrate holding part disposed above the heat insulating part and holding substrates in multiple stages; a process chamber processing the substrates held by the substrate holding part; a transfer chamber adjacent to the process chamber and transferring the substrates to the substrate holding part; a transfer mechanism transferring the substrate holder; a first gas supply part installed on one side of the transfer chamber and supplying gas into the transfer chamber; a second gas supply part having gas outlets at a height position between the substrate held at a lowermost stage of the substrate holding part and the heat insulating part and supplying a gas toward the substrate holder; and a controller controlling the transfer mechanism, the first gas supply part and the second gas supply part.


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