The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2020

Filed:

Apr. 11, 2019
Applicant:

Ulvac, Inc., Chigasaki-shi, Kanagawa, JP;

Inventors:

Takumi Yuze, Chigasaki, JP;

Toshihiro Terasawa, Chigasaki, JP;

Naruyasu Sasaki, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/08 (2006.01); H01J 27/08 (2006.01); H01J 49/10 (2006.01); H01J 37/30 (2006.01); H01J 37/317 (2006.01); H01J 27/02 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 27/02 (2013.01); H01J 37/3002 (2013.01); H01J 37/317 (2013.01); H01J 37/3171 (2013.01); H01L 21/265 (2013.01);
Abstract

An ion source having an ion generation container configured to generate ions by reacting ionized gas introduced into the container via a tubular gas introduction pipe with an ion source material emitted in the container. The gas introduction pipe is configured to introduce the ionized gas into an inner space of the gas introduction pipe via a gas supply pipe. In the inner space of the gas introduction pipe, a detachable cooling trap member is disposed and includes a cooling trap portion configured to cool and trap a byproduct produced in the ion generation container. The cooling trap portion is disposed near a supply-side leading end of the gas supply pipe in the inner space of the gas introduction pipe and is not contact with an interior wall face of the gas introduction pipe.


Find Patent Forward Citations

Yuze, Takumi. (2020). Ion source and ion implantation apparatus (U.S. Patent No. 10529532). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10529532

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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