The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2020
Filed:
Dec. 14, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Pieter Willem Herman De Jager, Middelbeers, NL;
Robert Albertus Johannes Van Der Werf, Eindhoven, NL;
Michaël Josephus Evert Van De Moosdijk, Veldhoven, NL;
Pascale Anne Maury, Veldhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G21B 3/00 (2006.01); B22F 3/105 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
G03F 7/70391 (2013.01); B22F 3/1055 (2013.01); G21B 3/006 (2013.01); B22F 2003/1056 (2013.01); B22F 2998/10 (2013.01); B82Y 40/00 (2013.01);
Abstract
A patterning apparatus, including: a substrate holder constructed to support a substrate; a particle generator configured to generate particles in the patterning apparatus, the particle generator configured to deposit the particles onto the substrate to form a layer of particles on the substrate; and a pattern generator in the patterning apparatus, the pattern generator configured to applying a pattern in the patterning apparatus to the deposited layer of particles.