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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10518382 B1

PDFFull Text
Date of Patent:
Dec. 31, 2019

Filed:

Dec. 09, 2016

Substrate processing system

Applicant:

K.c.tech Co., Ltd., Anseong-si, Gyeonggi-do, KR;

Inventors:

Young Kyu Kweon, Pyeongtaek-si, KR;

Byoung Chaul Son, Anseong-si, KR;

Moon Gi Cho, Seoul, KR;

Joon Ho An, Busan, KR;

Assignee:

KCTECH CO., LTD., Anseong-si, Gyeonggi, KR;

Attorney:

Kusner & Jaffe

Primary Examiner:

Robert A Rose

Int. Cl.
CPC ...
B24B 37/20 (2012.01); B08B 3/02 (2006.01); B08B 3/08 (2006.01); B08B 3/12 (2006.01); H01L 21/02 (2006.01); H01L 21/306 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B24B 37/20 (2013.01); B08B 3/02 (2013.01); B08B 3/08 (2013.01); B08B 3/12 (2013.01); H01L 21/02057 (2013.01); H01L 21/02096 (2013.01); H01L 21/30625 (2013.01); H01L 21/67046 (2013.01); H01L 21/67051 (2013.01); H01L 21/67092 (2013.01);
Abstract

A substrate processing system comprising a polishing part, a pre-cleaning region, and a cleaning part. The polishing part performs a Chemical Mechanical Polishing (CMP) process on a substrate. The pre-cleaning region is prepared in the polishing part and allows pre-cleaning performed on the substrate having undergone the polishing process. The cleaning part cleans the substrate pre-cleaned in the pre-cleaning region.

Find Patent Forward Citations

Kweon, Young. (2019). Substrate processing system (U.S. Patent No. 10518382). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10518382

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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