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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10514602 B1

PDFFull Text
Date of Patent:
Dec. 24, 2019

Filed:

Jul. 28, 2017

Resist composition and method for forming resist pattern

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, Kanagawa-ken, JP;

Inventor:

Tatsuya Fujii, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe, Martens, Olson & Bear LLP

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); C07C 67/14 (2006.01); C07C 69/54 (2006.01); C07D 307/93 (2006.01); C07D 309/12 (2006.01); C08F 12/24 (2006.01); C08F 20/16 (2006.01); C08F 244/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 67/14 (2013.01); C07C 69/54 (2013.01); C07D 307/93 (2013.01); C07D 309/12 (2013.01); C08F 12/24 (2013.01); C08F 20/16 (2013.01); C08F 244/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/2004 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/2059 (2013.01);
Abstract

A resist composition includes a base material component and a fluorine additive component. The fluorine additive component contains a fluororesin component having a structural unit containing a base dissociable group. The base material component contains a structural unit containing an acid-decomposable group in an amount of 30 mol % or more and an amount of 10 mol % or more of a resin component having a structural unit represented by formula (a10-1): where R is a hydrogen atom, an alkyl group having 1 to 5 carbon atoms, or a halogenated alkyl group having 1 to 5 carbon atoms, Yais a single bond or a divalent linking group, Wais a (n+1) valent aromatic hydrocarbon group, and nais an integer of 1 to 3.

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Fujii, Tatsuya. (2019). Resist composition and method for forming resist pattern (U.S. Patent No. 10514602). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10514602

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