The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Jun. 30, 2017
Applicant:
Beneq Oy, Espoo, FI;
Inventor:
Leif Keto, Espoo, FI;
Assignee:
BENEQ OY, Espoo, FI;
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/54 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45529 (2013.01); C23C 16/45551 (2013.01); C23C 16/545 (2013.01);
Abstract
A method for subjecting a surface of a substrate to successive surface reactions of precursors according to the principles of atomic layer deposition includes subjecting the surface of the substrate to the first precursor in a first precursor zone and subjecting the surface of the substrate to the second precursor in a second precursor zone, changing the first precursor in the first precursor zone to a subsequent precursor which is different than the first and second precursors, subjecting the surface of the substrate to the subsequent precursor in the first precursor zone, and subjecting the surface of the substrate to the second precursor in the second precursor zone.