The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 24, 2019
Filed:
Sep. 26, 2017
Veeco Instruments Inc., Plainview, NY (US);
Maria Ferreira, Somerset, NJ (US);
Joseph Lamb, Somerset, NJ (US);
Ankit Modi, Somerset, NJ (US);
David Gant, Somerset, NJ (US);
VEECO INSTRUMENTS INC., Plainview, NY (US);
Abstract
Filter elements for gaseous fluid (e.g., air) filtration for wafer processing systems. The filter elements have a pleat ratio of no greater than 7, where the pleat ratio is the number of pleats per mean diameter of the filter. By having a pleat ratio no greater than 7, and in some implementations also greater than 5, the filter is optimized for wafer processing systems and methods. This pleat ratio optimizes the spacing between pleats, thus balancing filtration media area against effective area, such as what might be lost due to contaminant bridging.