The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Sep. 23, 2016
Applicant:

Unimicron Technology Corp., Taoyuan, TW;

Inventor:

Shih-Lian Cheng, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 3/00 (2006.01); H05K 3/06 (2006.01); G03F 7/00 (2006.01); H05K 3/46 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H05K 1/11 (2006.01); H05K 3/10 (2006.01);
U.S. Cl.
CPC ...
H05K 3/064 (2013.01); G03F 7/0002 (2013.01); G03F 7/162 (2013.01); G03F 7/20 (2013.01); H05K 1/115 (2013.01); H05K 3/0023 (2013.01); H05K 3/06 (2013.01); H05K 3/108 (2013.01); H05K 3/465 (2013.01); H05K 3/4644 (2013.01); H05K 2201/091 (2013.01); H05K 2203/0108 (2013.01); H05K 2203/0369 (2013.01); H05K 2203/0502 (2013.01); H05K 2203/0548 (2013.01); H05K 2203/0562 (2013.01); Y10T 29/49124 (2015.01); Y10T 29/49155 (2015.01);
Abstract

A manufacturing method of a circuit board and a stamp are provided. The method includes the following steps. A circuit pattern and a dielectric layer covering the circuit pattern are formed on a dielectric substrate. A conductive via connected to the circuit pattern is formed in the dielectric layer. A photoresist material layer is formed on the dielectric layer. An imprinting process is performed on the photoresist material layer using a stamp to form a patterned photoresist layer, wherein the pressing side of the stamp facing the circuit pattern becomes sticky when subjected to pressure so as to catch photoresist residue from the photoresist material layer in the imprinting process. A patterned metal layer is formed on a region exposed by the patterned photoresist layer. The patterned photoresist layer is removed.


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