The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
Aug. 08, 2017
Ulvac, Inc., Chigasaki-shi, JP;
Junsuke Matsuzaki, Chigasaki, JP;
Hirohisa Takahashi, Chigasaki, JP;
ULVAC, INC., Chigasaki-shi, JP;
Abstract
The present invention provides a technique for performing film formation at low cost without causing a short-circuit between sputtered films formed on opposite surfaces of a film-formation target substrate. According to the present invention, in a substrate-holder conveyance mechanism, a substrate holderis conveyed by a first conveyance portion so that the substrate holderpasses through a first film formation region; film formation is performed by sputtering on a first surface of a film-formation target substrateheld by the substrate holder; the substrate holderis conveyed from the first conveyance portion to a second conveyance portion in such a manner as to make a turn with the up/down orientation of the substrate holdermaintained; the substrate holderis conveyed by the second conveyance portion in a direction opposite to the direction of conveyance by the first conveyance portion so that the substrate holderpasses through a second film formation region; and film formation is performed by sputtering on a second surface of the film-formation target substrate. The substrate holderhas openingsandthrough which first and second surfaces of the film-formation target substrateare exposed, and includes a shield portionfor shielding an edge portion of the film-formation target substratefrom a film formation material supplied from a second sputtering source.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile