The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 17, 2019

Filed:

Aug. 08, 2017
Applicant:

Ulvac, Inc., Chigasaki-shi, JP;

Inventors:

Junsuke Matsuzaki, Chigasaki, JP;

Hirohisa Takahashi, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/50 (2006.01); C23C 14/56 (2006.01); H01L 31/0747 (2012.01); C23C 14/34 (2006.01); C23C 14/54 (2006.01); H01L 31/20 (2006.01); C23C 14/04 (2006.01);
U.S. Cl.
CPC ...
C23C 14/505 (2013.01); C23C 14/042 (2013.01); C23C 14/3421 (2013.01); C23C 14/3464 (2013.01); C23C 14/50 (2013.01); C23C 14/541 (2013.01); C23C 14/56 (2013.01); C23C 14/568 (2013.01); H01L 31/0747 (2013.01); H01L 31/202 (2013.01); H01L 31/206 (2013.01); Y02E 10/50 (2013.01); Y02P 70/521 (2015.11);
Abstract

The present invention provides a technique for performing film formation at low cost without causing a short-circuit between sputtered films formed on opposite surfaces of a film-formation target substrate. According to the present invention, in a substrate-holder conveyance mechanism, a substrate holderis conveyed by a first conveyance portion so that the substrate holderpasses through a first film formation region; film formation is performed by sputtering on a first surface of a film-formation target substrateheld by the substrate holder; the substrate holderis conveyed from the first conveyance portion to a second conveyance portion in such a manner as to make a turn with the up/down orientation of the substrate holdermaintained; the substrate holderis conveyed by the second conveyance portion in a direction opposite to the direction of conveyance by the first conveyance portion so that the substrate holderpasses through a second film formation region; and film formation is performed by sputtering on a second surface of the film-formation target substrate. The substrate holderhas openingsandthrough which first and second surfaces of the film-formation target substrateare exposed, and includes a shield portionfor shielding an edge portion of the film-formation target substratefrom a film formation material supplied from a second sputtering source.


Find Patent Forward Citations

Matsuzaki, Junsuke. (2019). Film formation apparatus, film formation method, and manufacturing method of solar battery (U.S. Patent No. 10508332). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10508332

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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