The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2019
Filed:
Feb. 23, 2018
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
Jagdish Chandra Saraswatula, Puttaparthi, IN;
Saibal Banerjee, Fremont, CA (US);
Ashok Kulkarni, San Jose, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/84 (2012.01); G03F 7/20 (2006.01); G01N 21/956 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G03F 1/84 (2013.01); G01N 21/95607 (2013.01); G03F 7/70666 (2013.01); H01L 22/12 (2013.01);
Abstract
Techniques are provided that can select defects based on criticality of design pattern as well as defect attributes for process window qualification (PWQ). Defects are sorted into categories based on process conditions and similarity of design. Shape based grouping can be performed on the random defects. Highest design based grouping scores can be assigned to the bins, which are then sorted. Particular defects can be selected from the bins. These defects may be reviewed.