The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2019

Filed:

May. 17, 2017
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventor:

Shogo Mizota, Hsin-Chu, TW;

Assignee:

Tokyo Electron Limited, Minato-Ku, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/032 (2006.01); H01L 21/67 (2006.01); B08B 9/093 (2006.01);
U.S. Cl.
CPC ...
B08B 9/0325 (2013.01); H01L 21/67017 (2013.01); H01L 21/67051 (2013.01); B08B 9/093 (2013.01); H01L 21/67023 (2013.01);
Abstract

In one embodiment, a substrate liquid treatment apparatus includes: a tank that stores a processing liquid; a circulation line connected to the tank, through which circulation line a circulation flow of the processing liquid that leaves the tank and then returns back to the tank; a processing unit that processes a substrate by supplying the processing liquid, distributed from the circulation line, to the substrate; a return line that returns, to the tank, the processing liquid discharged from the processing unit after being supplied to the substrate; a cleaning nozzle that discharges a cleaning liquid onto an inner wall surface of the tank to clean the inner wall surface by the cleaning liquid; and a cleaning line that supplies the cleaning liquid to the cleaning nozzle.


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