The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Apr. 25, 2018
Asml Netherlands B.v., Veldhoven, NL;
Koen Gerhardus Winkels, Eindhoven, NL;
Georgiy O. Vaschenko, San Diego, CA (US);
Theodorus Wilhelmus Driessen, San Diego, CA (US);
Johan Frederik Dijksman, Weert, NL;
Bastiaan Lambertus Wilhelmus Marinus van de Ven, Rosmalen, NL;
Wilhelmus Henricus Theodorus Maria Aangenent, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.