The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Oct. 27, 2015
Entegris, Inc., Billerica, MA (US);
Oleg Byl, Southbury, CT (US);
Joseph D Sweeney, New Milford, CT (US);
ENTEGRIS, INC., Billerica, MA (US);
Abstract
An ion source apparatus which generates dopant species in a manner enabling low vapor pressure dopant source materials to be employed. The ion source apparatus (), comprising: an ion source chamber (); and a consumable structure in or associated with the ion source chamber (), said consumable structure comprising a solid dopant source material susceptible to reaction with a reactive gas for release of dopant in gaseous form to the ion source chamber. For example, the consumable structure is a dopant gas feed line () comprising a pipe or conduit having an interior layer formed of a solid dopant source material.