The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Feb. 16, 2017
Asml Netherlands B.v., Veldhoven, NL;
Hakki Ergün Cekli, Singapore, SG;
Güneş Nakibo{hacek over (g)}lu, Eindhoven, NL;
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Jean-Philippe Xavier Van Damme, Wezembeek-Oppem, BE;
Richard Johannes Franciscus Van Haren, Waalre, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A patterning device cooling system for thermally conditioning a patterning device of a lithographic apparatus, wherein the patterning device in use, is being irradiated by exposure radiation, wherein the patterning device cooling system has: a thermal conditioner configured to thermally condition the patterning device; and a controller configured to control the thermal conditioner to thermally condition the patterning device dependent on an amount of the exposure radiation absorbed by the patterning device.