The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Sep. 30, 2015
Asml Netherlands B.v., Veldhoven, NL;
Johannes Catharinus Hubertus Mulkens, Maastricht, NL;
Bob Streefkerk, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A projection optical system for an immersion exposure apparatus which exposes a substrate with an illumination light through the projection optical system and a liquid, the projection optical system includes: a plurality of reflective and refractive optical elements through which the illumination light passes, the plurality of reflective and refractive optical elements having a final lens, through which the illumination light passes, the final lens having a light emitting surface through a part of which the illumination light passes, the part of the light emitting surface being in contact with the liquid, wherein the image is projected in a projection region, a center of the projection region is away from an optical axis of the projection optical system with respect to a first direction perpendicular to the optical axis, and a center of the light emitting surface is away from the optical axis with respect to the first direction.