The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2019
Filed:
Aug. 03, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Han-Kwang Nienhuys, Utrecht, NL;
Gosse Charles De Vries, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G02B 26/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70191 (2013.01); G02B 26/023 (2013.01); G03F 7/70025 (2013.01); G03F 7/70033 (2013.01); G03F 7/7055 (2013.01); G03F 7/70158 (2013.01); G03F 7/70525 (2013.01);
Abstract
An apparatus () for adjusting an intensity of radiation. The apparatus comprises a grating () for receiving a radiation beam (B) and for directing at least a portion of the radiation beam in a first direction in the form of a first reflected radiation beam (B), and one or more first actuators operable to rotate the grating to adjust a grazing angle between the radiation beam and a surface of the grating so as to vary an intensity of the reflected radiation beam.