The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Sep. 25, 2018
Applicant:

Ev Group E. Thallner Gmbh, St. Florian am Inn, AT;

Inventor:

Gerald Kreindl, Scharding, AT;

Assignee:

EV GROUP E. THALLNER GMBH, St. Florian am Inn, AT;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41F 19/02 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
B41F 19/02 (2013.01); G03F 7/0002 (2013.01); G03F 7/70733 (2013.01); G03F 7/70783 (2013.01);
Abstract

A method for embossing a nanostructure, formed on a nanostructure punch, into a punch surface of a curable material which has been applied to a substrate. The method includes the following steps, especially following sequence: alignment of the nanostructure relative to the punch surface, embossing of the punch surface by a) prestressing of the nanostructure punch by deformation of the nanostructure punch and/or prestressing of the substrate by deformation of the substrate, b) making contact of a partial area of the punch surface with the nanostructure punch and c) automatic contacting of the remaining surface at least partially, especially predominantly, by the prestressing of the nanostructure punch and/or the prestressing of the substrate.


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