The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2019

Filed:

Jul. 08, 2009
Applicants:

Marcus Straw, Portland, OR (US);

David H. Narum, Banks, OR (US);

Milos Toth, Portland, OR (US);

Mark Utlaut, Scappoose, OR (US);

Guido Knippels, Schijndel, NL;

Gerardus Nicolaas Anne Van Veen, Waalre, NL;

Inventors:

Marcus Straw, Portland, OR (US);

David H. Narum, Banks, OR (US);

Milos Toth, Portland, OR (US);

Mark Utlaut, Scappoose, OR (US);

Guido Knippels, Schijndel, NL;

Gerardus Nicolaas Anne Van Veen, Waalre, NL;

Assignee:

FEI Company, Hillsboro, OR (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 26/03 (2006.01); B23K 26/08 (2014.01); B23K 26/14 (2014.01); B23K 26/0622 (2014.01); B23K 26/348 (2014.01);
U.S. Cl.
CPC ...
B23K 26/03 (2013.01); B23K 26/0622 (2015.10); B23K 26/0853 (2013.01); B23K 26/14 (2013.01); B23K 26/1423 (2013.01); B23K 26/348 (2015.10); H01J 2237/2813 (2013.01);
Abstract

Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics.


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