The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Mar. 12, 2018
Applicant:
Yield Engineering Systems, Inc., Livermore, CA (US);
Inventors:
William Moffat, San Jose, CA (US);
Craig Walter McCoy, San Jose, CA (US);
Assignee:
Yield Engineering Systems, Inc., Livermore, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F27D 5/00 (2006.01); H01L 21/673 (2006.01); H01L 21/67 (2006.01); F27D 1/18 (2006.01); H01L 21/02 (2006.01); H01L 21/677 (2006.01); F27D 7/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67376 (2013.01); F27D 1/1866 (2013.01); F27D 5/0037 (2013.01); H01L 21/02046 (2013.01); H01L 21/6719 (2013.01); H01L 21/67034 (2013.01); H01L 21/67126 (2013.01); H01L 21/67757 (2013.01); F27D 2007/063 (2013.01);
Abstract
A process chamber system adapted for both vacuum process steps and steps at pressures higher than atmospheric pressure. The chamber door may utilize a double door seal which allows for high vacuum in the gap between the seals such that the sealing force provided by the high vacuum in the seal gap is higher than the opposing forces due to the pressure inside the chamber and the weight of the components.