The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 26, 2019
Filed:
Sep. 27, 2018
Asml Netherlands B.v., Veldhoven, NL;
Johan Maria Van Boxmeer, Sint-Oedenrode, NL;
Marinus Johannes Maria Van Dam, Venlo, NL;
Koos Van Berkel, Waalre, NL;
Sietse Thijmen Van Der Post, Utrecht, NL;
Johannes Hubertus Antonius Van De Rijdt, Gemert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Disclosed is a method of optimizing within an inspection apparatus, the position and/or size (and therefore focus) of a measurement illumination spot relative to a target on a substrate. The method comprises detecting scattered radiation from at least the target resultant from illuminating the target, for different sizes and/or positions of said illumination spot relative to the target; and optimizing said position and/or size of the measurement illumination spot relative to the target based on a characteristic of the detected scattered radiation for the different sizes and/or positions of said illumination spot relative to the target.