The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 19, 2019
Filed:
May. 10, 2016
Applicant:
Hoya Corporation, Tokyo, JP;
Inventors:
Assignee:
HOYA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/32 (2012.01); G03F 1/50 (2012.01); G03F 1/54 (2012.01); G03F 1/74 (2012.01); G03F 1/78 (2012.01); G03F 1/80 (2012.01);
U.S. Cl.
CPC ...
G03F 1/32 (2013.01); G03F 1/50 (2013.01); G03F 1/54 (2013.01); G03F 1/74 (2013.01); G03F 1/78 (2013.01); G03F 1/80 (2013.01);
Abstract
A mask blank comprising an etching stopper film. The mask blank comprises a thin film for pattern formation on a main surface of a transparent substrate, and is featured in that: the thin film for pattern formation contains silicon, an etching stopper film is provided between the transparent substrate and the thin film for pattern formation, and the etching stopper film contains silicon, aluminum, and oxygen.