The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2019
Filed:
Oct. 28, 2018
United Microelectronics Corp., Hsin-Chu, TW;
An-Chi Liu, Tainan, TW;
Chun-Hsien Lin, Tainan, TW;
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Abstract
A method for forming a tunneling field effect transistor is disclosed, which includes the following steps. First, a semiconductor substrate is provided. A source region is formed on the semiconductor substrate. A tunneling region having a sidewall and a top surface is formed on the source region. A drain region is formed on the tunneling region. A gate dielectric layer is then formed, covering the sidewall and the top surface of the tunneling region. A first metal layer is formed, covering the gate dielectric layer. Subsequently, an anisotropic etching process is performed to remove a portion of the first metal layer. After the anisotropic etching process, a second metal layer is fabricated to cover the remaining first metal layer and the gate dielectric layer.